Evan tariq Al Waisy; Marwa S. Al Wazny
Abstract
In the present work, Bismuth and Bismuth trioxide thin films were prepared using reactive pulse laser deposition technique. Different laser fluence was employed ranged from (1.8 J/cm2- ...
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In the present work, Bismuth and Bismuth trioxide thin films were prepared using reactive pulse laser deposition technique. Different laser fluence was employed ranged from (1.8 J/cm2- 9.8 J/cm2) to investigatedthe physical properties. X –Ray diffraction result show a structure for the prepared films with monoclinic, tetragonal, and nonstoichiometric phases beside bismuth, while the atomic force microscopic result show grain size ranged from (33.48nm -131.6 nm) with different laser fluence. Optical properties result gave an energy gap value in the range of bismuth oxide (1.2-2.9 eV).
